Replacement of the Plasma Enhanced Chemical Vapor Deposition (PECVD) Instrument in the Nanoscale Fabrication Center

Description:
A new Plasma Enhanced Chemical Vapor Deposition (PECVD) Instrument in the Nanoscale Fabrication Center will ensure fabrication projects can continue. The PECVD deposits layers of SiO2 and SiNx and has many applications, including making insulating layers, protective layers, hard masks for patterned processing, optics and other fabrication methods that require these layers.
The Nanoscale Fabrication Center (NFC) provides a research facility for microfabrication technologies, products and innovations. The NFC maintains a suite of semiconductor and microfabrication processing equipment in a cleanroom laboratory.

PRINCIPAL INVESTIGATOR:
Chirag Gupta, assistant professor of electrical and computer engineering

CO-PRINCIPAL INVESTIGATOR:
Kurt Kupcho, laboratory manager of the NFC

CORE:
Nanoscale Fabrication Center (NFC)