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University of Wisconsin–Madison

State-of-the-Art, Reactive-Ion-Etching Instrument for Nanofabrication of Devices at UW–Madison

UW-Madison has established itself as a national leader in the area of nano-structured semiconductor materials and devices. This project provides acquisition of a reactive-ion etching (RIE) system to allow researchers on campus to further push the envelope on the emerging fields of semiconductor nano-fabrication and nano-manufacturing.

The etching system, called APEX SLR, working in conjunction with existing UW capabilities and strengths in materials synthesis and nano-patterning (newly acquired advanced electron-beam lithography system), will provide unique opportunities to UW-Madison for advancing materials and device development for the next generation of electronic and optoelectronics applications, such as ultra-low power dissipation lasers, extended- wavelength response detectors, and ultrahigh-efficiency multi-junction solar cells. This system will be housed in the Wisconsin Center for Applied Microelectronics (WCAM) cleanroom facility.

Principal Investigator

  • Luke Mawst
    Professor of Electrical and Computer Engineering

Co-Principal Investigator

  • Jerry Hunter
    Director of Research User Facilities for the UW–Madison College of Engineering

Collaborators

  • Susan Babcock
    Professor of Materials Science and Engineering
  • Dan Botez
    Professor of Electrical and Computer Engineering
  • Mark Eriksson
    Professor of Physics
  • Paul Evans
    Professor of Materials Science and Engineering
  • Mikhail Kats
    Assistant Professor of Electrical and Computer Engineering
  • Thomas Kuech
    Professor of Chemical and Biological Engineering
  • Jack Ma
    Professor of Electrical and Computer Engineering
  • Robert Farrell
    Assistant Professor of Electrical and Computer Engineering
  • Zongfu Yu
    Professor of Electrical and Computer Engineering