State-of-the-Art, Reactive-Ion-Etching Instrument for Nanofabrication of Devices at UW–Madison

UW-Madison has established itself as a national leader in the area of nano-structured semiconductor materials and devices. This project provides acquisition of a reactive-ion etching (RIE) system to allow researchers on campus to further push the envelope on the emerging fields of semiconductor nano-fabrication and nano-manufacturing.

The etching system, called APEX SLR, working in conjunction with existing UW capabilities and strengths in materials synthesis and nano-patterning (newly acquired advanced electron-beam lithography system), will provide unique opportunities to UW-Madison for advancing materials and device development for the next generation of electronic and optoelectronics applications, such as ultra-low power dissipation lasers, extended- wavelength response detectors, and ultrahigh-efficiency multi-junction solar cells. This system will be housed in the Wisconsin Center for Applied Microelectronics (WCAM) cleanroom facility.

Principal Investigator

• Luke Mawst
  Professor of Electrical and Computer Engineering
  

Co-Principal Investigator

• Jerry Hunter
  Director of Research User Facilities for the UW–Madison College of Engineering
  

Collaborators

• Susan Babcock
  Professor of Materials Science and Engineering
• Dan Botez
  Professor of Electrical and Computer Engineering
  
• Mark Eriksson
  Professor of Physics
• Paul Evans
  Professor of Materials Science and Engineering
• Mikhail Kats
  Assistant Professor of Electrical and Computer Engineering
  
• Thomas Kuech
  Professor of Chemical and Biological Engineering
• Jack Ma
  Professor of Electrical and Computer Engineering
• Robert Farrell
  Assistant Professor of Electrical and Computer Engineering
  
• Zongfu Yu
  Professor of Electrical and Computer Engineering